WebIf you are interested in this process, either by itself or as part of a longer processing sequence, please send us email at [email protected] or call us at (703) 262-5368 WebWe propose using two-dimensional (2-D) micromachined droplet ejector arrays for environmentally benign deposition of photoresist and other spin-on materials, such as low-k and high-k dielectrics...
Acoustic picoliter droplets for emerging applications in …
Webor a manual spin coater. After coating with HMDS, Shipley 3612 photoresist was spun onto the substrates (5500 rpm, 30s, 1 mm thick). Substrates were then postbaked (90 °C, 30 s) on a hotplate and allowed to cool. Photoresist-coated substrates were exposed (1.2 s, 17 mW/cm2) through a chrome-on-quartz mask on a mask aligner (Suss Microtec Inc., WebOct 30, 2007 · of Shipley 3612 resist is spun onto the wafers. Using a Karl Su¨ss MA-6 contact aligner, the wafers are exposed for 1 s using the top mask (ì) 365 nm, 15 mW/cm2). Afterward, they are developed (Shipley LDD-26W) for 180 s and hard-baked for 90 s at 115 °C to strengthen the resist. Aluminum is patterned using resist as the mask using a Cl lockwood chemist huddersfield
Acoustic picoliter droplets for emerging applications in …
WebIf you are interested in this process, either by itself or as part of a longer processing sequence, please send us email at [email protected] or call us at (703) 262-5368 WebPhotoresist coat (Shipley 3612) Backside protect (AZ P4400) Backside protect (NR1-6000PY) Hard baked resist coat (OiR 897 10i) Cool grease bonding Photoresist Spin Coat ACS200 (AZ 9245) Protective coating for KOH etch (ProTEK) Spin casting (Durimide 7520) Spin casting (Durimide) Spin casting Programmable Spinner G-line BCB coat (BCB 4000) WebIf you are interested in this process, either by itself or as part of a longer processing sequence, please send us email at [email protected] or call us at (703) 262-5368 indigo credit card payment app